File:Photolithography etching process.svg
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Summary
| Description |
English: Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. Note: Not to scale. |
| Source | Own work |
| Author | Cmglee |
| Other versions |
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Licensing
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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File history
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 08:27, 17 April 2022 | | 512 × 2,560 (8 KB) | Djiboun | File uploaded using svgtranslate tool (https://svgtranslate.toolforge.org/). Added translation for fr. |
| 13:18, 20 June 2020 |  | 512 × 2,560 (5 KB) | Mega deppa | Reverted to version as of 16:52, 9 October 2011 (UTC) | |
| 13:16, 20 June 2020 |  | 512 × 2,560 (8 KB) | Mega deppa | File uploaded using svgtranslate tool (https://svgtranslate.toolforge.org/). Added translation for ja. | |
| 16:52, 9 October 2011 |  | 512 × 2,560 (5 KB) | Cmglee | Align text, change enumeration and change colour to match Image:CMOS_fabrication_process.svg. | |
| 22:03, 30 September 2011 |  | 512 × 2,560 (5 KB) | Cmglee | Merge develop and remove exposed photoresist. | |
| 22:46, 29 September 2011 |  | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
| 22:39, 29 September 2011 |  | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
| 22:37, 29 September 2011 |  | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
| 22:30, 29 September 2011 |  | 512 × 3,413 (5 KB) | Cmglee | {{Information |Description ={{en|1=Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. }} |Source ={{own}} |Author =Cmglee |Date |
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