File:EUV T2S gap closure.png
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EUV_T2S_gap_closure.png (599 × 465 pixels, file size: 494 KB, MIME type: image/png)
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Summary
| Description | In a bidirectional metal layout, EUV SMO (source mask optimization) is still challenged by tip-to-side gap closure. The illumination is nearly dipole-shaped. Blue edges mark the original design, while the pink hashed regions indicate the contour process variation (PV) bands. Circled areas indicate particularly high-risk spots. Ref.:M. Crouse et al., Proc. SPIE 10148, 101480H (2017). |
| Date | |
| Source | Graphic editor, PowerPoint |
| Author | Guiding light |
Licensing
Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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Original upload log
The original description page was here. All following user names refer to en.wikipedia.
| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 2017-07-20 15:08:01 | 599 × 465 | Guiding light | Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]] |
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File history
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 16:01, 2 April 2020 | | 599 × 465 (494 KB) | Hippymoose17 | Transferred from en.wikipedia (MTC!) (1.1.0) |
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